Specifications

• JEOL (SM-09010). 
• Cross-section polishing using ion beam milling. 
• Pressure gauge: penning type.
• An optical microscope for specimen positioning. 
• Controls for the vacuum system. 
• Accelerating voltage: (Acc. V.): 2 -- 6kV 
• Cross-Section Area: 500µm width. 
• Etching Speed: 1.3µM/min 100µm from Si edge. 
• Specimen Size: 15 x 9 x 6mm largest sample option 
• Specimen movement range: 3 ± mm (X & Y axes) - Specimen tilt range: ± 5°.

Principles

The specimen stage in the chamber features a holder and shield plate. The specimen is placed in the holder, and the region of the sample to be cross-sectioned is selected under the optical microscope. After evacuating the specimen chamber, a broad argon ion beam irradiates the surface of the specimen partially masked by a shielding plate. Thus, the region that is not masked by the shielding plate is etched. During milling, the specimen stage can be automatically rocked ± 30° to prevent beam striations and insure uniform etching of composite materials with differ­ent hardness, preventing the soft portions from being cut faster than the hard portions.

Capabilities

• Offers high quality cross-sections of soft and hard materials.
• Minimum strain and distortion of the polished surface.
• Large cross-section areas (1.5 mm wide and several hundreds of microns deep).
• No particle embedding in the polished surface.
• Low running cost.
• Ease of operation.
• No wastewater or chemical.
• Friendly to environment.

Applications

• Gold wire Bond.
• Galvanized Coating.
• Fiber Optics.
• Thin Film Analysis