Specifications

• Nanofilm_EP3SE.
• Moving range of x/y/z. stage:100mm(x/y)30mm(z).
• Repeatability: 1 µm.
• Sample imaging area: 25x40 mm².
• Maximum lateral resolution: 1 µm.
• Laser used: 658nm.
• Spectroscopic range: 380nm -- 900nm.
• Imaging system: 768 x 572 pixel CCD. camera with variable shutter timings and gain control.

Principles

Ellipsometry is an optical nondestructive technique allowing the accurate characterization of thin films, surfaces, and interfaces. It measures changes in the state of polarization of light. If the surface is covered by a thin film, the entire optical system influences the change in polarization. It is, therefore, possible to deduce information about the thin film optical properties including, refractive index, extinction coefficient, and film thickness.

Capabilities

• Delta- and thickness-maps are unique features of the EP3View software and can obtain one unique thickness map of a thin film.
• It can identify thickness variations in vertical resolution (\<1 nm) in real time.
• The Imaging Ellipsometer EP^3^ identifies steps in monolayers much faster and with less effort than SPM.
• It is capable of measuring film thickness, refractive index, and optical loss constant (t,n,k) at various wavelengths.
• EP^3^ Ellipsometer is capable of performing profile mapping of those parameters.

Applications

• Material Science.
• Biology & Biophysics.
• Semiconductor Physics.
• Microelectronics.